INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT"

GENEVA, May 14 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2024/052699) for "OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT" on Oct 24, 2024. With publication no. WO/2025/096270, the details related to the patent application was published on May 08, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): GHINOVKER, Mark (Tsayalim Street, 69 Apt. #220692 Yoqneam Ilit)

Abstract: An overlay metrology system may receive images of an overlay target on a sample, where the overlay target includes Moire structures in which first-layer feat...