INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "OPTICAL AND X-RAY METROLOGY METHODS FOR PATTERNED SEMICONDUCTOR STRUCTURES WITH RANDOMNESS"

GENEVA, May 14 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2024/053488) for "OPTICAL AND X-RAY METROLOGY METHODS FOR PATTERNED SEMICONDUCTOR STRUCTURES WITH RANDOMNESS" on Oct 30, 2024. With publication no. WO/2025/096486, the details related to the patent application was published on May 08, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HAXTON, Daniel James (38000 Camden StApt 15Fremont, California 94536), LIMAN, Christopher (95 Hobson StApt 8BSan Jose, California 95110), KIM, InKyo (10109 S. Blaney AveApt ACupertino, California 95...