INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "METROLOGY METHOD OF CALIBRATING AND MONITORING RADIATION IN EUV LITHOGRAPHIC SYSTEMS"

GENEVA, May 14 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2024/053159) for "METROLOGY METHOD OF CALIBRATING AND MONITORING RADIATION IN EUV LITHOGRAPHIC SYSTEMS" on Oct 28, 2024. With publication no. WO/2025/096316, the details related to the patent application was published on May 08, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): JENSEN, Earl (625 Barto StreetSanta Clara, California 95051), GUBLER, Joshua (5752 Ribchester CtSan Jose, California 95123)

Abstract: An instrumented substrate may provide a metrology platform for moni...