INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "METHODS AND SYSTEMS FOR REFLECTOMETRY BASED MEASUREMENTS OF DEEP, LARGE PITCH SEMICONDUCTOR STRUCTURES"

GENEVA, July 30 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/011941) for "METHODS AND SYSTEMS FOR REFLECTOMETRY BASED MEASUREMENTS OF DEEP, LARGE PITCH SEMICONDUCTOR STRUCTURES" on Jan 16, 2025. With publication no. WO/2025/155767, the details related to the patent application was published on Jul 24, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): PETERLINZ, Kevin (105 Reflections Drive, Apt. 11San Ramon, California 94583), SHI, Jinchuan (536 Loch Lomond CourtMilpitas, California 95035), ATKINS, Phillip R. (1588 Carmel DriveSan J...