GENEVA, April 8 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2024/048253) for "METHOD TO CALIBRATE, PREDICT, AND CONTROL STOCHASTIC DEFECTS IN EUV LITHOGRAPHY" on Sep 25, 2024. With publication no. WO/2025/072229, the details related to the patent application was published on Apr 03, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VUKKADALA, Pradeep (1323 Kiely Blvd.Santa Clara, California 95051), ZHANG, Cao (504 W Davis Ave.Ann Arbor, Michigan 48103), BUROV, Anatoly (5302 Welcome GlenAustin, Texas 78759), PARSEY, Guy (2500 Deake Ave.A...