INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "DARK FIELD IMAGING SYSTEM WITH TWICE-DIFFRACTED LIGHT FOR OVERLAY METROLOGY"

GENEVA, Feb. 4 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/038071) for "DARK FIELD IMAGING SYSTEM WITH TWICE-DIFFRACTED LIGHT FOR OVERLAY METROLOGY" on Jul 17, 2025. With publication no. WO/2026/024536, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CAI, Wenjian (1228 Henderson Avenue #3Sunnyvale, California 94086), LIU, Xuefeng (1092 Prouty Wy.San Jose, California 95129), FIELDEN, John (2020 Victoria Ct.Los Altos, California 94024), CHUANG, Yung-Ho Alex (107...