INTERNATIONAL PATENT: KLA CORPORATION FILES APPLICATION FOR "ABERRATION CORRECTOR FOR SCANNING ELECTRON MICROSCOPE WITH MULTIPLE ELECTRON BEAMS"

GENEVA, Nov. 25 -- KLA CORPORATION (One Technology DriveMilpitas, California 95035) filed a patent application (PCT/US2025/029657) for "ABERRATION CORRECTOR FOR SCANNING ELECTRON MICROSCOPE WITH MULTIPLE ELECTRON BEAMS" on May 15, 2025. With publication no. WO/2025/240800, the details related to the patent application was published on Nov 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BRODIE, Alan D. (998 Van Auken CirclePalo Alto, California 94303), JIANG, Xinrong (2651 South CourtPalo Alto, California 94306)

Abstract: Two Wien filters are disposed in the path of the charged particle ...