INTERNATIONAL PATENT: KCTECH CO., LTD., 주식회사 케이씨텍 FILES APPLICATION FOR "CMP SLURRY COMPOSITION COMPRISING SURFACE-MODIFIED NANO CERIA PARTICLES"

GENEVA, April 20 -- KCTECH CO., LTD. (12, Je2gongdan 3-gil, Miyang-myeonAnseong-SiGyeonggi-do 17599), 주식회사 케이씨텍 (경기도안성시미양면 제2공단3길 12) filed a patent application (PCT/KR2024/014922) for "CMP SLURRY COMPOSITION COMPRISING SURFACE-MODIFIED NANO CERIA PARTICLES" on Oct 02, 2024. With publication no. WO/2025/079915, the details related to the patent application was published on Apr 17, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YANG, Hye Eun (50 D...