INTERNATIONAL PATENT: KASHIWAYA, SHUN FILES APPLICATION FOR "FACET-SELECTIVE ELECTROSTATIC ASSEMBLING OF COMPOSITE AND ITS USE IN CATALYSIS SYSTEMS"

GENEVA, Aug. 25 -- KASHIWAYA, Shun (Mantalsgatan 10583 36 LINKOPING) filed a patent application (PCT/SE2024/050163) for "FACET-SELECTIVE ELECTROSTATIC ASSEMBLING OF COMPOSITE AND ITS USE IN CATALYSIS SYSTEMS" on Feb 16, 2024. With publication no. WO/2025/174284, the details related to the patent application was published on Aug 21, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KASHIWAYA, Shun (Mantalsgatan 10583 36 LINKOPING)

Abstract: A method (100) for manufacturing a composite, the method comprises providing (101) crystal particles comprising semiconductor materials, the crystal part...