INTERNATIONAL PATENT: JX ADVANCED METALS CORPORATION, ＪＸ金属株式会社 FILES APPLICATION FOR "SPUTTERING TARGET FOR MAGNETIC MATERIAL, SPUTTERING TARGET ASSEMBLY FOR MAGNETIC MATERIAL AND MANUFACTURING METHOD FOR SPUTTERING TARGET FOR MAGNETIC MATERIAL"

GENEVA, March 25 -- JX ADVANCED METALS CORPORATION (10-4, Toranomon 2-chome, Minato-ku, Tokyo1058417), ＪＸ金属株式会社 (東京都港区虎ノ門二丁目１０番４号) filed a patent application (PCT/JP2024/031766) for "SPUTTERING TARGET FOR MAGNETIC MATERIAL, SPUTTERING TARGET ASSEMBLY FOR MAGNETIC MATERIAL, AND MANUFACTURING METHOD FOR SPUTTERING TARGET FOR MAGNETIC MATERIAL" on Sep 04, 2024. With publication no. WO/2025/057840, the details related to the patent application was published on Mar 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, ...