INTERNATIONAL PATENT: JX ADVANCED METALS CORPORATION, ＪＸ金属株式会社 FILES APPLICATION FOR "OXIDE SPUTTERING TARGET, METHOD FOR MANUFACTURING SAME AND OXIDE POWDER"

GENEVA, Feb. 3 -- JX ADVANCED METALS CORPORATION (10-4, Toranomon 2-chome, Minato-ku, Tokyo1058417), ＪＸ金属株式会社 (東京都港区虎ノ門二丁目１０番４号) filed a patent application (PCT/JP2025/017296) for "OXIDE SPUTTERING TARGET, METHOD FOR MANUFACTURING SAME, AND OXIDE POWDER" on May 13, 2025. With publication no. WO/2026/023204, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SU...