INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD"

GENEVA, Dec. 1 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東新橋一丁目９番２号) filed a patent application (PCT/JP2025/017899) for "RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD" on May 16, 2025. With publication no. WO/2025/243956, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HACHIYA, Asuka (c/o JSR CORPORA...