INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD AND POLYMER"

GENEVA, March 24 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東新橋一丁目９番２号) filed a patent application (PCT/JP2024/025965) for "RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND POLYMER" on Jul 19, 2024. With publication no. WO/2025/057562, the details related to the patent application was published on Mar 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): NONOYAMA,Yoshiki (c/o JSR ...