INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, PATTERN FORMING METHOD AND COMPOUND"

GENEVA, July 3 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東新橋一丁目９番２号) filed a patent application (PCT/JP2024/041401) for "RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, PATTERN FORMING METHOD, AND COMPOUND" on Nov 22, 2024. With publication no. WO/2025/134675, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organ...