INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND COMPOSITION"

GENEVA, Dec. 30 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東新橋一丁目９番２号) filed a patent application (PCT/JP2025/018136) for "METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND COMPOSITION" on May 20, 2025. With publication no. WO/2025/263206, the details related to the patent application was published on Dec 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): OKA,Yuki (c/o JSR CORPORATION, 9-2, H...