GENEVA, April 19 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東新橋一丁目９番２号) filed a patent application (PCT/JP2024/035444) for "METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE" on Oct 03, 2024. With publication no. WO/2025/079496, the details related to the patent application was published on Apr 17, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SERIZAWA,Ryuichi (c/o JSR CORPORATION, 9-2, Higa...