INTERNATIONAL PATENT: JSG JAPAN CO., LTD., 晶盛機電日本株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING SILICON NITRIDE SUBSTRATE"

GENEVA, Jan. 13 -- JSG JAPAN CO., LTD. (902, Kawasaki Tech Center, 580-16, Horikawa-cho, Saiwai-ku, Kawasaki-shi, Kanagawa2128560), 晶盛機電日本株式会社 (神奈川県川崎市幸区堀川町５８０－１６　川崎テックセンター９０２) filed a patent application (PCT/JP2024/038274) for "METHOD FOR PRODUCING SILICON NITRIDE SUBSTRATE" on Oct 28, 2024. With publication no. WO/2026/009464, the details related to the patent application was published on Jan 08, 2026.

Notably, the patent application was submitted under th...