INTERNATIONAL PATENT: JNC CORPORATION, ＪＮＣ株式会社 FILES APPLICATION FOR "COMPOSITION FOR FORMING LOW DIELECTRIC CONSTANT RESIN, LOW DIELECTRIC CONSTANT RESIN COMPONENT AND ELECTRONIC DEVICE USING SAME"

GENEVA, Oct. 27 -- JNC CORPORATION (2-1, Otemachi 2-chome, Chiyoda-ku, Tokyo1008105), ＪＮＣ株式会社 (東京都千代田区大手町二丁目２番１号) filed a patent application (PCT/JP2025/009037) for "COMPOSITION FOR FORMING LOW DIELECTRIC CONSTANT RESIN, LOW DIELECTRIC CONSTANT RESIN COMPONENT, AND ELECTRONIC DEVICE USING SAME" on Mar 11, 2025. With publication no. WO/2025/220362, the details related to the patent application was published on Oct 23, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Prope...