GENEVA, Nov. 2 -- JI HUA LABORATORY (No. 28 Huandao South Road, Guicheng Street, Nanhai DistrictFoshan, Guangdong 528200), 季华实验室 (中国广东省佛山市南海区桂城街道环岛南路28号) filed a patent application (PCT/CN2024/119833) for "MULTI-EVAPORATION-SOURCE INTERVAL EVAPORATION DEPOSITION DEVICE AND COATING METHOD" on Sep 19, 2024. With publication no. WO/2025/222742, the details related to the patent application was published on Oct 30, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Prop...