INTERNATIONAL PATENT: IQM FINLAND OY FILES APPLICATION FOR "ON-RESONANCE PARAMETRIC GATES WITH REDUCED LEAKAGE BY MODULATION FREQUENCY SELECTION"

GENEVA, Sept. 29 -- IQM FINLAND OY (Keilaranta 1902150 Espoo) filed a patent application (PCT/EP2025/057188) for "ON-RESONANCE PARAMETRIC GATES WITH REDUCED LEAKAGE BY MODULATION FREQUENCY SELECTION" on Mar 17, 2025. With publication no. WO/2025/195959, the details related to the patent application was published on Sep 25, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): NATH, Jayshankar (c/o IQM Germany GmbHGeorg-Brauchle-Ring 23-2580992 Munich), THAPA, Mansih (c/o IQM Germany GmbHGeorg-Brauchle-Ring 23-2580992 Munich), KU, Hsiang-Sheng (c/o IQM Germany GmbHGeorg-Brauchle-Ring 23-2580992 Mun...