INTERNATIONAL PATENT: INSTITUT FEDERAL DE METROLOGIE METAS FILES APPLICATION FOR "A MEASUREMENT PROBE FOR ON-WAFER TESTING OF SEMICONDUCTOR DEVICES AND THE MANUFACTURING PROCESS THEREOF"

GENEVA, Nov. 17 -- INSTITUT FEDERAL DE METROLOGIE METAS (Lindenweg 503003 BERN-WABERN) filed a patent application (PCT/EP2025/062134) for "A MEASUREMENT PROBE FOR ON-WAFER TESTING OF SEMICONDUCTOR DEVICES, AND THE MANUFACTURING PROCESS THEREOF" on May 02, 2025. With publication no. WO/2025/233253, the details related to the patent application was published on Nov 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): HOFFMANN, Johannes (Chez Institut Federal de Metrologie METASLindenweg 503003 BERN-WABERN), LIN, Hung-Ju (Chez Institut Federal de Metrologie METASLindenweg 503003 BERN-WABERN), DE...