INTERNATIONAL PATENT: INPRIA CORPORATION FILES APPLICATION FOR "ALKYLSULFONIC ACID DEVELOPER COMPOSITIONS AND PATTERNING METHODS FOR ORGANOMETALLIC OXIDE PHOTORESISTS"

GENEVA, Dec. 31 -- INPRIA CORPORATION (1100 NE Circle Blvd.Suite 360Corvallis, Oregon 97330) filed a patent application (PCT/US2025/033903) for "ALKYLSULFONIC ACID DEVELOPER COMPOSITIONS AND PATTERNING METHODS FOR ORGANOMETALLIC OXIDE PHOTORESISTS" on Jun 17, 2025. With publication no. WO/2025/264623, the details related to the patent application was published on Dec 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VOSS, Matthew (2210 NW 12th StreetCorvallis, Oregon 97330), JIANG, Kai (1511 SW Birdie DriveCorvallis, Oregon 97333)

Abstract: Patterning of organometallic radiation sensitive...