INTERNATIONAL PATENT: INFLY TECH (SHANGHAI) CO., LTD., 无限光年（上海）技术有限公司 FILES APPLICATION FOR "TEXT GENERATION METHOD, APPARATUS AND SYSTEM, COMPUTING DEVICE AND READABLE STORAGE MEDIUM"

GENEVA, Nov. 30 -- INFLY TECH (SHANGHAI) CO., LTD. (Room 1325, Floor 2, No.25-1 Hongcao RoadXuhui District, Shanghai 200233), 无限光年（上海）技术有限公司 (中国上海市徐汇区虹漕路25-1号2层1325室) filed a patent application (PCT/CN2024/140680) for "TEXT GENERATION METHOD, APPARATUS AND SYSTEM, COMPUTING DEVICE, AND READABLE STORAGE MEDIUM" on Dec 19, 2024. With publication no. WO/2025/241513, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, whic...