INTERNATIONAL PATENT: INFINEON TECHNOLOGIES LLC FILES APPLICATION FOR "METHOD OF EQUALIZING GATE HEIGHTS IN EMBEDDED NON-VOLATILE MEMORY ON HKMG TECHNOLOGY"

GENEVA, Nov. 18 -- INFINEON TECHNOLOGIES LLC (198 Champion CourtSan Jose, California 95134) filed a patent application (PCT/US2025/016078) for "METHOD OF EQUALIZING GATE HEIGHTS IN EMBEDDED NON-VOLATILE MEMORY ON HKMG TECHNOLOGY" on Feb 14, 2025. With publication no. WO/2025/235053, the details related to the patent application was published on Nov 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): RAMKUMAR, Krishnaswamy (1193 Lynbrook WaySan Jose, California 95129), SHETTY, Shivananda (360 Camphor AveFremont, California 94539)

Abstract: Semiconductor devices and methods of manufacturing t...