GENEVA, Dec. 8 -- IEE INTERNATIONAL ELECTRONICS & ENGINEERING S.A. (Zone industrielle12, rue Pierre Richardot6468 Echternach) filed a patent application (PCT/EP2025/063239) for "SYSTEM AND METHOD FOR IMPEDANCE MEASUREMENT" on May 14, 2025. With publication no. WO/2025/247643, the details related to the patent application was published on Dec 04, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): LAMESCH, Laurent (5, rue de Saeul8558 REICHLANGE)
Abstract: A system (1) for impedance measurement comprises: - a first voltage source (2), adapted to generate an alternating first supply voltage with ...