INTERNATIONAL PATENT: HUAWEI TECHNOLOGIES CO., LTD., WU, PATRICK FILES APPLICATION FOR "METHODS FOR MANUFACTURING AN AVALANCHE PHOTODETECTOR BASED ON REPAIR OF LATTICE MISMATCH AND REDUCTION OF ELECTRICAL FIELD SPIKES"

GENEVA, Jan. 4 -- HUAWEI TECHNOLOGIES CO., LTD. (Huawei Administration Building BantianLonggang DistrictShenzhen, Guangdong 518129), WU, Patrick (Huawei Technologies Duesseldorf GmbHRiesstr. 2580992 Munich) filed a patent application (PCT/EP2024/068378) for "METHODS FOR MANUFACTURING AN AVALANCHE PHOTODETECTOR BASED ON REPAIR OF LATTICE MISMATCH AND REDUCTION OF ELECTRICAL FIELD SPIKES" on Jun 28, 2024. With publication no. WO/2026/002405, the details related to the patent application was published on Jan 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MAZZILLO, Massimo Cataldo (Huawei T...