INTERNATIONAL PATENT: HOYA CORPORATION, ＨＯＹＡ株式会社 FILES APPLICATION FOR "REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE"

GENEVA, July 9 -- HOYA CORPORATION (6-10-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo1608347), ＨＯＹＡ株式会社 (東京都新宿区西新宿六丁目１０番１号) filed a patent application (PCT/JP2024/045423) for "REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE" on Dec 23, 2024. With publication no. WO/2025/142825, the details related to the patent application was published on Jul 03, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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