INTERNATIONAL PATENT: HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク FILES APPLICATION FOR "PROGRAM, MOTION TRACKING DEVICE, RADIATION TREATMENT SYSTEM AND MOTION TRACKING METHOD"

GENEVA, Oct. 4 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2024/030104) for "PROGRAM, MOTION TRACKING DEVICE, RADIATION TREATMENT SYSTEM, AND MOTION TRACKING METHOD" on Aug 23, 2024. With publication no. WO/2025/203731, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organiz...