INTERNATIONAL PATENT: HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク FILES APPLICATION FOR "PLASMA PROCESSING DEVICE, MISALIGNMENT AMOUNT DETECTION DEVICE AND MISALIGNMENT AMOUNT CORRECTION METHOD"

GENEVA, July 20 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2024/000448) for "PLASMA PROCESSING DEVICE, MISALIGNMENT AMOUNT DETECTION DEVICE, AND MISALIGNMENT AMOUNT CORRECTION METHOD" on Jan 11, 2024. With publication no. WO/2025/150150, the details related to the patent application was published on Jul 17, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectu...