GENEVA, Aug. 5 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2024/002275) for "METHOD FOR PRODUCING ANODIZED COATING, ALUMITE COMPONENT, AND PLASMA PROCESSING DEVICE" on Jan 25, 2024. With publication no. WO/2025/158630, the details related to the patent application was published on Jul 31, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organiza...