INTERNATIONAL PATENT: HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク FILES APPLICATION FOR "ION SOURCE, CIRCULAR ACCELERATOR AND PARTICLE BEAM THERAPY SYSTEM"

GENEVA, April 28 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2024/029537) for "ION SOURCE, CIRCULAR ACCELERATOR, AND PARTICLE BEAM THERAPY SYSTEM" on Aug 20, 2024. With publication no. WO/2025/083993, the details related to the patent application was published on Apr 24, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inve...