INTERNATIONAL PATENT: HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク FILES APPLICATION FOR "ACCELERATOR SYSTEM, PARTICLE BEAM TREATMENT SYSTEM, CONTROL METHOD OF ACCELERATOR SYSTEM AND CONTROL METHOD OF PARTICLE BEAM TREATMENT SYSTEM"

GENEVA, Oct. 5 -- HITACHI HIGH-TECH CORPORATION (1-17-1 Toranomon, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2024/040849) for "ACCELERATOR SYSTEM, PARTICLE BEAM TREATMENT SYSTEM, CONTROL METHOD OF ACCELERATOR SYSTEM, AND CONTROL METHOD OF PARTICLE BEAM TREATMENT SYSTEM" on Nov 18, 2024. With publication no. WO/2025/203848, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is ma...