GENEVA, Oct. 4 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2024/029630) for "ACCELERATOR SYSTEM, PARTICLE BEAM TREATMENT SYSTEM, CONTROL METHOD FOR ACCELERATOR, AND CONTROL METHOD FOR PARTICLE BEAM TREATMENT SYSTEM" on Aug 21, 2024. With publication no. WO/2025/203729, the details related to the patent application was published on Oct 02, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is ...