GENEVA, Oct. 4 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2024/030448) for "ACCELERATOR SYSTEM, PARTICLE BEAM TREATMENT SYSTEM, ACCELERATOR CONTROL METHOD, AND PARTICLE BEAM TREATMENT SYSTEM CONTROL METHOD" on Aug 27, 2024. With publication no. WO/2025/203733, the details related to the patent application was published on Oct 02, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed ...