GENEVA, March 17 -- HITACHI, LTD. (6-6, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008280), 株式会社日立製作所 (東京都千代田区丸の内一丁目６番６号) filed a patent application (PCT/JP2024/031262) for "MONITORING SYSTEM AND MONITORING METHOD" on Aug 30, 2024. With publication no. WO/2025/053079, the details related to the patent application was published on Mar 13, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): NAITO, Shunya (c/o HITACHI, LTD.,...