INTERNATIONAL PATENT: HITACHI, LTD., 株式会社日立製作所 FILES APPLICATION FOR "INCENTIVE GRANTING SYSTEM AND INCENTIVE GRANTING METHOD"

GENEVA, Oct. 4 -- HITACHI, LTD. (6-6, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008280), 株式会社日立製作所 (東京都千代田区丸の内一丁目６番６号) filed a patent application (PCT/JP2024/011648) for "INCENTIVE GRANTING SYSTEM AND INCENTIVE GRANTING METHOD" on Mar 25, 2024. With publication no. WO/2025/203173, the details related to the patent application was published on Oct 02, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KIRITA Shingo (c/o ...