GENEVA, Nov. 18 -- HITACHI, LTD. (6-6, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008280), 株式会社日立製作所 (東京都千代田区丸の内一丁目６番６号) filed a patent application (PCT/JP2025/015385) for "DEFECT INSPECTION SYSTEM AND DEFECT INSPECTION METHOD" on Apr 21, 2025. With publication no. WO/2025/234307, the details related to the patent application was published on Nov 13, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): MARUNO Kenji (c/o HI...