INTERNATIONAL PATENT: HELIATEK GMBH FILES APPLICATION FOR "A PEROVSKITE PHOTOVOLTAIC ELEMENT COMPRISING A METAL OXIDE LAYER BETWEEN A PEROVSKITE PHOTOACTIVE LAYER AND A BACK ELECTRODE AND HAVING A N-I-P-N ARCHITECTURE"

GENEVA, Feb. 3 -- HELIATEK GMBH (Treidlerstr. 301139 Dresden) filed a patent application (PCT/IB2024/000423) for "A PEROVSKITE PHOTOVOLTAIC ELEMENT COMPRISING A METAL OXIDE LAYER BETWEEN A PEROVSKITE PHOTOACTIVE LAYER AND A BACK ELECTRODE, AND HAVING A N-I-P-N ARCHITECTURE" on Jul 27, 2024. With publication no. WO/2025/022179, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): UHRICH, Christian (Heliatek GmbHTreidlerstr. 301139 Dresden), WEISS, Andre (Heliatek GmbHTreidlerstr. 301139 Dresden), LE, Phuong (Heliatek GmbHTreidl...