INTERNATIONAL PATENT: HEIQ MATERIALS AG FILES APPLICATION FOR "METHOD FOR MAKING AND/OR DELAMINATING POROUS GRAPHENE MEMBRANES AND MEMBRANES PRODUCED USING THE METHOD"

GENEVA, April 14 -- HEIQ MATERIALS AG (Rutistrasse 128952 Schlieren) filed a patent application (PCT/EP2024/076852) for "METHOD FOR MAKING AND/OR DELAMINATING POROUS GRAPHENE MEMBRANES AND MEMBRANES PRODUCED USING THE METHOD" on Sep 25, 2024. With publication no. WO/2025/073545, the details related to the patent application was published on Apr 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CHOI, Kyungjun (Alsenstrasse 418800 Thalwil), HEIGHT, Murray J. (49 Virginia StreetNewtown, Victoria 3220)

Abstract: Method for making a porous graphene layer (5) comprising the following steps: p...