GENEVA, June 3 -- HANSOL CHEMICAL CO., LTD. (7~8F, 513, Teheran-ro,Gangnamgu,Seoul 06169), 주식회사 한솔케미칼 (서울특별시강남구테헤란로 513, 7~8 층) filed a patent application (PCT/KR2024/016695) for "PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT THEREOF, PATTERN FORMATION METHOD, AND METHOD FOR PREPARING PHOTOSENSITIVE RESIN COMPOSITION" on Oct 29, 2024. With publication no. WO/2025/110532, the details related to the patent application was published on May 30, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intell...