INTERNATIONAL PATENT: GENTEX CORPORATION FILES APPLICATION FOR "MONITORING SYSTEM AND METHOD HAVING PERIODIC ARTIFACT REDUCTION"

GENEVA, April 28 -- GENTEX CORPORATION (600 North Centennial StreetZeeland, Michigan 49464) filed a patent application (PCT/IB2024/060156) for "MONITORING SYSTEM AND METHOD HAVING PERIODIC ARTIFACT REDUCTION" on Oct 16, 2024. With publication no. WO/2025/083584, the details related to the patent application was published on Apr 24, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SAENGER NAYVER, Mario F. (600 North Centennial StreetZeeland, Michigan 49464), HILLDORE, Benjamin B. (600 North Centennial StreetZeeland, Michigan 49464)

Abstract: The disclosure provides for a system for monitori...