INTERNATIONAL PATENT: GELEST, INC. FILES APPLICATION FOR "LOW TEMPERATURE PLASMA DEPOSITION OF SILICON-CONTAINING FILMS USING HYDROGEN PEROXIDE"

GENEVA, Oct. 28 -- GELEST, INC. (11 East Steel RoadMorrisville, PA 19067) filed a patent application (PCT/US2025/023868) for "LOW TEMPERATURE PLASMA DEPOSITION OF SILICON-CONTAINING FILMS USING HYDROGEN PEROXIDE" on Apr 09, 2025. With publication no. WO/2025/221537, the details related to the patent application was published on Oct 23, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BRICK, Chad, Michael (19 Wilfred DriveYardley, PA 19067), OGATA, Tomoyuki (c/o Mitsubishi Chemical Corporation1-1, Marunouchi 1-chome, Chiyoda-kuTokyo, 100-8251)

Abstract: Provided are methods for increasing the...