INTERNATIONAL PATENT: GELEST, INC. FILES APPLICATION FOR "INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON METAL SUBSTRATE"

GENEVA, March 18 -- GELEST, INC. (11 E. Steel RoadMorrisville, PA 19067) filed a patent application (PCT/US2024/040492) for "INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON METAL SUBSTRATE" on Aug 01, 2024. With publication no. WO/2025/053926, the details related to the patent application was published on Mar 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BRICK, Chad, Michael (19 Wilfred DriveYardley, PA 19067), OGATA, Tomoyuki (8104 Spruce Mill DrYardley, PA 19067)

Abstract: An inherently selective process for the deposition of silicon-containing dielectric la...