INTERNATIONAL PATENT: GE INFRASTRUCTURE TECHNOLOGY LLC, GENERAL ELECTRIC TECHNOLOGY GMBH FILES APPLICATION FOR "SYSTEM AND METHOD FOR GAS CAPTURE USING MULTIPLE ADSORPTION STAGES"

GENEVA, July 3 -- GE INFRASTRUCTURE TECHNOLOGY LLC (300 Garlington RoadGreenville, South Carolina 29615), GENERAL ELECTRIC TECHNOLOGY GMBH (Brown Boveri Strasse 85400 Baden) filed a patent application (PCT/US2023/084640) for "SYSTEM AND METHOD FOR GAS CAPTURE USING MULTIPLE ADSORPTION STAGES" on Dec 18, 2023. With publication no. WO/2025/136353, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): THANGANADAR, Dhinesh (GE India Industrial Pvt. Ltd.122 EPIP-II, Whitefield RdBangalore 560066), WHISENHUNT, JR., Donald Wayne (1 Re...