GENEVA, July 30 -- FONONTECH HOLDING B.V. (Van Dijklaan 15J5581 WG Waalre) filed a patent application (PCT/NL2025/050017) for "DEPOSITION SYSTEM AND METHOD" on Jan 10, 2025. With publication no. WO/2025/155190, the details related to the patent application was published on Jul 24, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): FIJN, Joost (c/o Van Dijklaan 15J5581 WG Waalre), HENDRIKS, Rob Jacob (c/o Van Dijklaan 15J5581 WG Waalre)
Abstract:
A deposition system (1) is disclosed herein for heat induced deposition of a donor element (d1, d2,...,d6) from a donor surface (2s) onto a target s...