INTERNATIONAL PATENT: FICT LIMITED, ＦＩＣＴ株式会社 FILES APPLICATION FOR "MULTILAYER SUBSTRATE, METHOD FOR MANUFACTURING MULTILAYER SUBSTRATE AND ELECTRONIC DEVICE"

GENEVA, Dec. 1 -- FICT LIMITED (36, Oaza Kitaowaribe, Nagano-shi, Nagano3818501), ＦＩＣＴ株式会社 (長野県長野市大字北尾張部３６番地) filed a patent application (PCT/JP2025/008091) for "MULTILAYER SUBSTRATE, METHOD FOR MANUFACTURING MULTILAYER SUBSTRATE, AND ELECTRONIC DEVICE" on Mar 06, 2025. With publication no. WO/2025/243640, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): OZA...