INTERNATIONAL PATENT: EVONIK OPERATIONS GMBH FILES APPLICATION FOR "METHOD FOR IMPROVED SELECTIVE ETCHING OF SILICON NITRIDE OVER SILICON OXIDE"

GENEVA, Sept. 29 -- EVONIK OPERATIONS GMBH (Rellinghauser Strasse 1-1145128 Essen) filed a patent application (PCT/EP2025/056446) for "METHOD FOR IMPROVED SELECTIVE ETCHING OF SILICON NITRIDE OVER SILICON OXIDE" on Mar 10, 2025. With publication no. WO/2025/195822, the details related to the patent application was published on Sep 25, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): LAU, Ka Cheong (2119 Milan StEaston, Pennsylvania 18045), FARID, George (251 Robert Morris BlvdAllentown, Pennsylvania 18104), RUBERU, Thanthirige Purnima A (4040 Blaise CourtAllentown, Pennsylvania 18104)

Abstra...