INTERNATIONAL PATENT: ETSY, INC. FILES APPLICATION FOR "ENTROPY-BASED MACHINE LEARNING"

GENEVA, Feb. 4 -- ETSY, INC. (117 Adams St.Brooklyn, New York 11201) filed a patent application (PCT/US2024/039843) for "ENTROPY-BASED MACHINE LEARNING" on Jul 26, 2024. With publication no. WO/2026/024293, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MORGENSTERN, Ilan (117 Adams St.Brooklyn, Minnesota 11201), CRESPO, Pablo (117 Adams St.Brooklyn, Minnesota 11201), YILDIZ, Ecran (117 Adams St.Brooklyn, Minnesota 11201)

Abstract: Methods, systems, and apparatus, including computer programs encoded on computer storage m...