INTERNATIONAL PATENT: ENATECH CORPORATION, 株式会社エナテック FILES APPLICATION FOR "COATING DEVICE, COATING METHOD, LIGHT IRRADIATION DEVICE, LIGHT IRRADIATION METHOD AND COATING SYSTEM"

GENEVA, March 24 -- ENATECH CORPORATION (10-10, Technostage 3-chome, Izumi-shi, Osaka5941144), 株式会社エナテック (大阪府和泉市テクノステージ３丁目１０番１０号) filed a patent application (PCT/JP2024/025185) for "COATING DEVICE, COATING METHOD, LIGHT IRRADIATION DEVICE, LIGHT IRRADIATION METHOD, AND COATING SYSTEM" on Jul 11, 2024. With publication no. WO/2025/057553, the details related to the patent application was published on Mar 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is ...