INTERNATIONAL PATENT: EBARA CORPORATION, 株式会社荏原製作所 FILES APPLICATION FOR "RETAINER RING, SUBSTRATE POLISHING DEVICE, SUBSTRATE PROCESSING DEVICE AND METHOD FOR CLEANING RETAINER RING"

GENEVA, Dec. 9 -- EBARA CORPORATION (11-1, Haneda Asahi-cho, Ota-ku, Tokyo1448510), 株式会社荏原製作所 (東京都大田区羽田旭町１１番１号) filed a patent application (PCT/JP2025/019207) for "RETAINER RING, SUBSTRATE POLISHING DEVICE, SUBSTRATE PROCESSING DEVICE, AND METHOD FOR CLEANING RETAINER RING" on May 28, 2025. With publication no. WO/2025/249454, the details related to the patent application was published on Dec 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIP...